Highest Resolution Electrical Measurements

Graphene Moiré Pattern 100nm with Defect

sMIM-C image of Moiré pattern from graphene. The Moire pattern is created by the lattice mismatch between the graphene and unerlying h-BN film. The 100nm x 100nm area shows in detail the Moiré patterns. The hexagonal structures are 14.4 nm edge to edge in a very regular arrray. The image shows a missing sidewall of a single Moiré pattern feature highlighting the resolution quality of this data set. The ScanWave system was integrated on an Asylum Research MFP-3D. Sample was prepared by SIMIT, Shanghai courtesy of Dr. H. Wang.